INTRODUCTION
The Tek-Vac LPE-3750 / 4750 Liquid-Phase Epitaxial Reactor utilizes a graphite slider boat technique to produce high quality semiconductors at high throughput rates. Automated Control provides uniform processing from run to run. An IBM PC, or compatible, uses Graphic Displays to develop process recipes and procedures. The LPE-3750 / 4750 can operate in a stand-alone mode.
The quartz process tube is cantilevered, permitting easy removal of the furnace. The process tube can then cool down rapidly, assisted by special cooling fan, to speed overall throughput.
An N2 glovebox system, complete with stainless steel ante-chamber, and maintained at slight overpressure, ensures a controlled, contamination-free process environment.
The vacuum system consists of a 2-stage roughing pump and dual sorption pumps for fast pump down and minimal maintenance.
Numerous safety sensors and limit monitors provide an orderly shutdown if specific operating conditions are not met.