DRIE-1000 SERIES SYSTEMS: SINGLE CHAMBER PLASMA PROCESSING.
DRIE-1200-LL-ICP (NEW !!): HIGH DENSITY PLASMA ETCHER FOR ANISOTROPIC APPLICATIONS. 200mm WAFER CAPABILITIES.
MPS-2000 SERIES SYSTEMS: INLINE MULTI-CHAMBER PLASMA PROCESSING.
PDS-6000 CLUSTER TOOL: PRODUCTION SYSTEM WITH CENTRAL DISTRIBUTION LOADLOCK & ROBOT.
DRIE-1100-LL-ECR: DRIE SERIES HIGH-DENSITY PLASMA SYSTEMS WITH ELECTRON CYCLOTRON RESONANCE SOURCE.
UHV-CVD-5000: ULTRA-HIGH VACUUM CHEMICAL VAPOR DEPOSITION.
VES-3000 BELL-JAR COATERS: VACUUM EVAPORATION / METALLIZATION. THERMAL, E-BEAM, & SPUTTERING.
CVD-300 SYSTEM: THERMAL CVD VACUUM FURNACE IDEAL FOR RESEARCH AND SMALL-SCALE PRODUCTION.
PECVD-60 SYSTEM: R&D MICROWAVE PLASMA CVD. DIAMOND, BORON NITRIDE, SILICON CARBIDE, ETC.
LPE 3750 and 4750 SYSTEMS: PRODUCTION LIQUID-PHASE EPITAXY. GaAs, GaP, InP, ETC.
MSI-3000 SYSTEM: A COMPLETE MASS SPECTROMETER GAS HANDLING AND INLET TOOL FOR GAS CONTROL AND NUCLEAR SERVICE APPLICATIONS.
LRGAS-100, -200, -300: RGA GAS ANALYSIS SYSTEMS MOUNTED IN A MOBILE CART. COMPLETE WITH 100, 200, OR 300 AMU RGA HEAD, TURBO PUMP SYSTEM, VACUUM GAUGING, COMPUTER, AND CONTROL PANEL. DRY (OIL FREE) CONFIGURATIONS AVAILABLE.
MOCVD 500-A: AN R&D METAL-ORGANIC CVD SYSTEM.
MBE-6000 SYSTEM: R&D MOLECULAR BEAM EPITAXY.
PA-3000-A ETCHER: A BATCH PLASMA ASHING MODULE. APPLICATIONS FOR CLEANING WAFERS, PC BOARD DESMEARING, AND REACTIVE ION ETCH. PROCESS UP TO 200 SILICON WAFERS PER LOAD.
VACUUM CHAMBERS: ALTITUDE TESTING, DEGASSING, INERT GAS STORAGE, IMPREGNATION, ETC.
GLOVEBOXES: PROVIDES INERT ENVIRONMENT FOR HANDLING & STORING REACTIVE MATERIALS.
BURNBOX / SCRUBBER MODULES: TREATMENT OF COMMON SEMICONDUCTOR PROCESS EXHAUST GASES.
VARI-VAC ® GAS METERING VALVES: A LOW COST METHOD OF DELIVERING PRECISION GAS FLOW.
PHOTORESIST CURING SYSTEM: THERMAL BAKE OUT PROCESSING FOR SUBSTRATE SIZES TO 12" X 12" SQUARE.
GAS DISTRIBUTION: TEK-VAC OFFERS VARIOUS ENGINEERING, DESIGN, AND MANUFACTURING SERVICES FOR EQUIPMENT SUB-ASSEMBLIES.
FLO-MASTER FM-2001: A POWER SUPPLY, FLOW CONTROL, AND FLOW READOUT DEVICE, INTENDED TO CONTROL MOST COMMERCIALLY AVAILABLE MASS FLOW CONTROLLERS.
ION GAUGE TUBES: STANDARD BAYARD-ALPERT IONIZATION GAUGE TUBE WITH YOUR CHOICE OF FITTINGS (TUBULATION, CONFLAT, KF-25).